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晶洲装备先后完成了从G2.5到G8.6及以上尺寸CF、Array、TP等工艺湿制程显影机设备的自主研发 Developer

Processes: A single substrate needs to be developed for more than 5 times, accounting for about 10% of all processes for panels
QTY of units: Demand only from front-end factory of AMOLED 30K ≥ 12 units/set

  • Developer

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High-precision and stable transmition

Precise process control

Superior substrate surface processing

Comprehensive anti-contamination

Complete solutions



Specification

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  Applicable process


CF、Array、TP


  Applicable substrate size


All sizes


  Applicable substrate thickness


≥0.3mm


  Development type


Oscillation type shower


  Equipment type


I type, U type, line type, customized

  Process capability


Highly-uniform ultra-low-pressure spraying

Excellent process reliability, high CD uniformity

Defoaming management

No foggy spots, rolling marks, contamination, scratches

Low operating cost



Inquiry
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